PL-360LP Photolithography Mask Aligner Filter 215x215mm
SKU: W2930
The PL-360LP mask aligner filter for photolithography offers improved exposures, and sharper, straighter feature walls of the SU-8 photoresist. With a nominal cut-on wavelength of 360nm, blocking shorter wavelengths and transmitting the longer wavelengths including the useful 365, 405 & 436nm mercury lines.
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The PL-360LP mask aligner filter for photolithography offers improved exposures, and sharper, straighter feature walls of the SU-8 photoresist. With a nominal cut-on wavelength of 360nm, blocking shorter wavelengths and transmitting the longer wavelengths including the useful 365, 405 & 436nm mercury lines.
Spectral Curves
The spectral curve and ascii data is a typical representation of this filter’s performance, but will vary due to production and design variations. Omega only guarantees this part to meet the product specifications listed. The displayed OD is calculated from a %T measurement. The blocking regions are likely higher OD than what is displayed here. To learn more about the challenges of measuring high OD values, see our paper.
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Detailed Specifications
| Transmitted Wavefront Distortion |
ns
|
| Angle of Incidence |
0
|
| Minimum Surface Quality |
Surface per MIL-O-13830A (80/50)
|
| Coating Type |
Protected Coating
|
| Filter Type |
Longpass
|
| Filter Application |
Photolithography
|
| Fluorescence Component |
Photolithography
|
| Flatness |
ns
|
| Parallelism |
ns
|
| Cut-on Wavelength (nm) |
365.00
|
| Cut-on Wavelength Tolerance |
+7/-7
|